Talk:Near-field scanning optical microscope
 | This article is rated C-class on Wikipedia's content assessment scale. It is of interest to the following WikiProjects: | ||||||||||
| |||||||||||
.jpg){kind=small}
Hi there, the volume number of reference 3 is missing. Maybe someboby wants to doublecheck and amend it. I Found the source to be:
The Journal of Chemical Physics, Volume 112, Issue 18, pp. 7761-7774
--137.195.250.2 11:00, 29 October 2007 (UTC)bernd
Hello - For the sake of transparency, I am an employee of Nanonics Imaging. I just updated a link to the Nanonics website which had been pointing to an incorrect URL. Thanks. — Preceding unsigned comment added by 109.226.23.202 (talk) 07:04, 5 June 2017 (UTC)
Near field surface plasmon enhanced nanolithography - a functionally identical technique differing only by use of a stronger laser on substrates to be ablated or radiation dosed[edit]
Literally this technology works identically *through-tip* surface plasmon enhanced nanolithography. There are 2 basic types in the literature. THe "microsphere enhanced tip-to-substrate microjet" kind and the "through-hole AFM probe highly focused laser" kind. The only other difference I can see in the NSOM is that the laser is intended for imaging and the detector is designed for imaging. In Lithography, the laser is desgined for ablation, and the detector is designed simply for control and feedback (since the patterning and operation are programmed into the piezostage and laser 67.165.123.62 (talk) 19:02, 13 September 2023 (UTC)